|Process Chamber with Multi-Source
|Octagonal structure with an inscribed circle diameter 1m(Ø) x 1.05m(H)
|Multi-Arc Source and Ion Beam Cleaning Source
|2pcs x TC Gauge, 1pc x Ion Gauge
|High Vacuum Pump
|2pcs x 3,000 L/s Turbo Molecular Pump
|Capacitance Manometer, Multiple MFCs
|Mechanical Pump (Roughing)
|Rotary Pump + Roots Pump
|< 1.0 x 10-4 Pa
|PCD0.5m (Ø ) x 0.8m (H)
|Holder Rotation Speed 0 - 3 rpm, Bias-able
|≈ 4.8 (L) x 3.6 (W) x 2.6 (H) m
What are the main advantages of Nanofilm coating equipment?
What are the vaporization methods of your coating equipment?
What substates can your coating equipment coat?
What is the substrate maximum size?
We provide coating equipment with chamber size as big as 1.5m x 1.5m. The maximum size of substrate depends on the shape. Please get in touch with us to learn more.
What type of coating can your equipment coat?
What is your lead time?
Do you have any question and want to know more about our services? We will be glad to support you.