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FCVA Hybrid In-line System

Based on modular design, the system is flexible to increase or decrease number of chambers according to your needs. Each process chamber is equipped with 1 pair of of FCVA (Filtered Cathodic Vacuum Arc) source and 1 pair Linear Sputtering source or Cylindrical Rotating Sputter source. The system is plasma based, highly configurable and produces highly uniformed coating with wide range of composite. It is specially designed with large vacuum gate valve. It has throughput up to 5 minutes per batch and able to continually operate for more than 3 days (72 hrs).

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Features

  • FCVA

    Excellent coating performance

  • Carbon or Metal
    Source

    Extend coating types

  • Large Vacuum
    Gate Valve

    High throughput rate

  • Modular Design

    Flexible to increase to decrease
    number of chambers

  • Customisable
    Substrate Holder

    That fits your needs

  • User Friendly
    Control Panel

    Easy to operate and control

Specification

Chamber Dimension 1.1 (L) x 1.51 (W) x 1.06 (H) m
Chamber Material SUS 304
Process Gas MFCs for Ar and N2
Gate Valve 1.082 x 0.8 m
Coating Range 0.5 m (H)
Vacuum System Pirani Gauge and High Vacuum Gauge
Process Configuration Standard or Customise
Chamber Configuration Standard or Customise
Ion Beam Source Ion Beam source of End Hall type with beam voltage of up to 2500V and beam power of up to 1kW
Sputtering Source Cylinder or Flat
FCVA-C Source FCVA-C Source with Arc Power Supply, 3kW Power Supply for filter and 1kW Power Supply for anode
FCVA-M Source FCVA-M Source with Arc Power Supply, 3kW Power Supply for filter and 1kW Power Supply for anode
System Dimension ≈ 12 (L) x 7 (W) x 3 (H) m (8 Chambers)
 

Applications

  • Tool and Die
  • Measurement and Analytics
  • Optics
  • Textile
  • Semiconductor
  • Automotive
  • Printing and Imaging
  • Sanitary Fitting
  • Life Science

Other Coating Equipment

Frequently Asked Questions

  • What are the main advantages of Nanofilm coating equipment? 

    We have been engineering, designing, and manufacturing vacuum coating / physical vapor deposition (PVD) / thin-film coating equipment for over 25 years and are a leader in the field. We are an integrated player providing both coating equipment and coating services. Our experiences in coating services provide first-hand knowledge that translate to state-of-the-art equipment that fit your production needs. We are your one-stop partner that provide equipment, deposition source materials, vaporization source, spare parts and after sales services.

  • What are the vaporization methods of your coating equipment? 

    Our equipment portfolio includes ion-beam, magnetron sputtering, filtered cathodic vacuum arc (FCVA) PVD vaporization method. The filtered cathodic vacuum arc (FCVA) is our proprietary technology, a plasma-based vaporization method that provide better control and more uniformed coating on a wide range of substrates.

  • What substates can your coating equipment coat? 

    Our equipment can coat a wide range of substrates including metal (stainless steel, copper, aluminium), alloy, polymer (plastic), ceramics.

  • What is the substrate maximum size?  

    We provide coating equipment with chamber size as big as 1.5m x 1.5m. The maximum size of substrate depends on the shape. Please get in touch with us to learn more.

  • What type of coating can your equipment coat? 

    Our equipment can coat diamond-like coating, optical filter coating, anti-reflective coating, conductive coating, and hydrophobic coating, multi-layer composite coating. 

  • What is your lead time?  

    Lead time varies depending on your specification. Please get in touch to learn more. 

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