PVD Coating Technology

Nanofilm is a leader in Physical Vapour Deposition (PVD) technology

Physical Vapour Deposition (PVD) Technology

PVD is a dry surface treatment process, a method of thin film deposition, that ejects material from a "target" source in solid form onto a "substrate“ in vacuum. The process is safe and environmentally friendly with three simple steps: Vapourisation of the source using sputtering, cathodic arc or electron beam; transport the source material in gas form to substrate surface; nucleation and growth of the source material to produce thin film on the surface of substrate.

Main Advantages of Nanofilm PVD

Compared to traditional surface treatment such as electroplating and painting, PVD has several main advantages

  • Safe & Environmentally Friendly

    Safe and environmentally friendly, as it almost produce no harmful chemical residuals.

  • Excellent
    Performance

    Produce harder and more corrosion resistance thin film, with good impact strength, excellent scratch and abrasion resistance.

  • Extended Coating
    Portfolio

    Able to utilize wide range of inorganic and some organic coating materials on a diverse group of substrates.

  • Nanofilm PVD Technology Portfolio

    Our PVD technology portfolio include FCVA, sputtering and ion-beam. We cater the coating technology to substrate material, performance requirement and cost-benefit consideration.

    Get In Touch
  • Nanofilm PVD Technology Portfolio

    Our PVD technology portfolio include FCVA, sputtering and ion-beam. We cater the coating technology to substrate material, performance requirement and cost-benefit consideration.

    Get In Touch
  • Nanofilm PVD Technology Portfolio

    Our PVD technology portfolio include FCVA, sputtering and ion-beam. We cater the coating technology to substrate material, performance requirement and cost-benefit consideration.

    Get In Touch
  • PVD Tech
  • Sputtering
  • Ion-Beam
  • FCVA

  • Sputtering

  • Ion-Beam

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