At the heart of NTI Nanofilm’s innovation is our Filtered Cathodic Vacuum Arc (FCVA) technology, a fully plasma-based process that creates ultra-dense ta-C coatings with exceptional purity, hardness, and adhesion. Engineered for particle-sensitive applications.
FCVA enables highly adjustable coatings for optimal Diamond and Graphite-like properties, enables dense and uniform coatings
- Particles trapped in the bend enable pure high-energy ion deposition, forming cleaner and denser coatings.
Key Parameters | Filtered Cathodic Vacuum Arc | Physical Vapor Deposition | Chemical Vapor Deposition |
---|---|---|---|
Coating species | Ions | Atoms | Radicals |
Adhesion | Excellent | Fair | Fair |
Thickness (µm) | 0.1 – 15 | 0.2 – 5 | 0.1 – 2 |
Hardness (Hv) | ~ 1 500 – 5 500 | ~ 2 000 – 3 000 | ~ 1 500 – 3 000 |
Film density (g/cm3) | ~ 3.4 | ~ 2.2 | ~ 2.0 |
Coating uniformity | Software adjustable | Hardware dependent | Hardware dependent |
Target material | Solids | Solids | Gases |
Deposition temperature (°C) | < 100 | 150 – 500 | 600 – 1 100 |
Substrates | Wide range including plastics rubbers alloy metals | Mostly conductive metals | Mostly conductive metals |